Publication:
Stencil-based selective surface functionalization of silicon nanowires in 3D device architectures for next-generation biochemical sensors

dc.contributor.coauthorEsfahani, Mohammad Nasr
dc.contributor.coauthorLeblebici, Yusuf
dc.contributor.departmentDepartment of Mechanical Engineering
dc.contributor.kuauthorAli, Basit
dc.contributor.kuauthorÖzkan, Sena Nur
dc.contributor.kuauthorAkıncı, Seçkin
dc.contributor.kuauthorÖztürk, Ece
dc.contributor.kuauthorAlaca, Burhanettin Erdem
dc.contributor.otherDepartment of Mechanical Engineering
dc.contributor.researchcenterKoç University Research Center for Translational Medicine (KUTTAM) / Koç Üniversitesi Translasyonel Tıp Araştırma Merkezi (KUTTAM)
dc.contributor.researchcentern2STAR-Koç University Nanofabrication and Nanocharacterization Center for Scientifc and Technological Advanced Research
dc.contributor.researchcenterKoç University Surface Science and Technology Center (KUYTAM) / Koç Üniversitesi Yüzey Teknolojileri Araştırmaları Merkezi (KUYTAM)
dc.contributor.schoolcollegeinstituteGraduate School of Sciences and Engineering
dc.contributor.schoolcollegeinstituteGraduate School of Health Sciences
dc.contributor.schoolcollegeinstituteCollege of Engineering
dc.contributor.schoolcollegeinstituteSchool of Medicine
dc.date.accessioned2024-12-29T09:40:15Z
dc.date.issued2024
dc.description.abstractSurface functionalization of 1D materials such as silicon nanowires is a critical preparation technology for biochemical sensing. However, existing nonselective functionalization techniques result in nonlocal binding and contamination, with potential device damage risks. Associated risks are further exacerbated for next-generation devices of a 3D nature with challenging topographies. Such 3D devices draw inspiration from the out-of-plane evolution of planar transistors to FinFETs and to today's gate-all-around transistors. This study is the first reported technological work addressing stencil-based surface decoration and selective functionalization of a suspended silicon nanowire building block embedded within such a device that involves two-order-of-magnitude thicker features compared to the nanowire critical dimensions. A gold pattern resolution of 3.0 mu m atop the silicon nanowires is achieved with a stencil aperture critical dimension of 2.2 mu m, accompanied by a die-level registration accuracy of 1.2 +/- 0.3 mu m. Plasma-enhanced chemical vapor deposition-based silicon nitride stencil membranes as large as 300 x 300 mu m2 are used to define the apertures without any membrane fracture during fabrication and membrane cleaning. The pattern-blurring aspect as a resolution-limiting factor is assessed by using 24 individual nanowire devices. Finally, gold-patterned silicon nanowires are functionalized using thiolated heparin and employed for selective attachment and detection of the human recombinant basic fibroblast growth factor (FGF-2). With the potential involvement in angiogenesis, the process of new blood vessel formation crucial for tumor growth, FGF-2 can serve as a potential prognostic biomarker in oncology. Demonstrated selectively on nanowires with high pattern resolution, the proposed functionalization approach offers possibilities for parallel sensing using vast nanowire arrays embedded in 3D device architectures developed for next-generation biochemical sensors in addition to serving various encapsulation and packaging needs.
dc.description.indexedbyWoS
dc.description.indexedbyScopus
dc.description.issue9
dc.description.publisherscopeInternational
dc.description.sponsoredbyTubitakEuTÜBİTAK
dc.description.sponsorsB. Erdem Alaca and Basit Ali gratefully acknowledge the financial support by Tubitak under grant nos. 118C155 and 123E455.
dc.description.volume7
dc.identifier.doi10.1021/acsanm.4c01065
dc.identifier.eissn2574-0970
dc.identifier.quartileQ2
dc.identifier.scopus2-s2.0-85192221123
dc.identifier.urihttps://doi.org/10.1021/acsanm.4c01065
dc.identifier.urihttps://hdl.handle.net/20.500.14288/23274
dc.identifier.wos1228055800001
dc.keywordsSilicon nanowire
dc.keywordsSurfacefunctionalization
dc.keywords3D MEMS devices
dc.keywordsStencil lithography
dc.keywordsExtracellularmatrix
dc.keywordsHeparin
dc.languageen
dc.publisherAmerican Chemical Society
dc.sourceACS Applied Nano Materials
dc.subjectNanoscience and nanotechnology
dc.subjectMaterials science, multidisciplinary
dc.titleStencil-based selective surface functionalization of silicon nanowires in 3D device architectures for next-generation biochemical sensors
dc.typeJournal article
dspace.entity.typePublication
local.contributor.kuauthorAli, Basit
local.contributor.kuauthorÖzkan, Sena Nur
local.contributor.kuauthorKerimzade, Umut Mehrdad
local.contributor.kuauthorAkıncı, Seçkin
local.contributor.kuauthorÖztürk, Ece
local.contributor.kuauthorAlaca, Burhanettin Erdem
relation.isOrgUnitOfPublicationba2836f3-206d-4724-918c-f598f0086a36
relation.isOrgUnitOfPublication.latestForDiscoveryba2836f3-206d-4724-918c-f598f0086a36

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