Atomic force microscopy investigation of asymmetric diblock copolymer morphologies in thin films

Abstract

Microphase separation and the resulting morphology of asymmetric diblock copolymers of poly(v-caprolactone) (PCL) in thin films have been investigated by atomic force microscopy. Copolymers consisted of a short block of PCL (M-n similar to 2500-4500 g/mole) and a longer second block of poly(methyl methacrylate) (PMMA), poly(styrene) (PS) or poly(cyclohexene oxide) (PCHO). Tendency for microphase separation above the glass transition temperature of the second block (PMMA, PS or PCHO) resulted in a pitted morphology on the surface of the thin films. This tendency was strongest for PMMA and weakest for PCHO. The presence of up to 54%, PMMA homopolymer in PCL-PMMA block copolymer did not prevent the formation of such pitted morphology on the surface. The effect of the chemical structure of the second block and the possible orientations of the block copolymer molecules in thin films are discussed. (C) 2004 Elsevier Ltd. All rights reserved.