Publication:
The fast-track water oxidation channel on BiVO4 opened by nitrogen treatment

dc.contributor.coauthorN/A
dc.contributor.departmentDepartment of Chemistry
dc.contributor.departmentDepartment of Physics
dc.contributor.departmentGraduate School of Sciences and Engineering
dc.contributor.departmentKUTEM (Koç University Tüpraş Energy Center)
dc.contributor.departmentKUYTAM (Koç University Surface Science and Technology Center)
dc.contributor.kuauthorBarzgarvishlaghi, Mahsa
dc.contributor.kuauthorKahraman, Abdullah
dc.contributor.kuauthorKaya, Sarp
dc.contributor.kuauthorSennaroğlu, Alphan
dc.contributor.kuauthorBaylam, Işınsu
dc.contributor.schoolcollegeinstituteCollege of Sciences
dc.contributor.schoolcollegeinstituteGRADUATE SCHOOL OF SCIENCES AND ENGINEERING
dc.contributor.schoolcollegeinstituteResearch Center
dc.date.accessioned2024-11-09T23:38:22Z
dc.date.issued2020
dc.description.abstractBiVO4 is one of the most promising photoanode materials for water-splitting systems. Nitrogen incorporation into a BiVO4 surface overcomes the known bottleneck in its charge-transfer kinetics into the electrolyte. We explored the role of nitrogen in the surface charge recombination and charge-transfer kinetics by employing transient photocurrent spectroscopy at the time scale of surface recombination and water oxidation kinetics, transient absorption spectroscopy, and X-ray photoelectron spectroscopy. We attributed the activity enhancement mechanism to the accelerated V5+/V4+ redox process, in which incorporated nitrogen suppresses a limiting surface recombination channel by increasing the oxygen vacancies.
dc.description.indexedbyWOS
dc.description.indexedbyScopus
dc.description.indexedbyPubMed
dc.description.issue20
dc.description.openaccessYES
dc.description.publisherscopeInternational
dc.description.sponsoredbyTubitakEuN/A
dc.description.sponsorshipScientific and Technical Research Council of Turkey [114Z305] This work was supported by The Scientific and Technical Research Council of Turkey (Grant No. 114Z305). The authors thank Koc University Surface Science and Technology Center for the characterization measurements and the Turkish Accelerator & Radiation Laboratory for the collaborative research support.
dc.description.volume11
dc.identifier.doi10.1021/acs.jpclett.0c02190
dc.identifier.issn1948-7185
dc.identifier.quartileQ2
dc.identifier.scopus2-s2.0-85093538424
dc.identifier.urihttps://doi.org/10.1021/acs.jpclett.0c02190
dc.identifier.urihttps://hdl.handle.net/20.500.14288/12947
dc.identifier.wos582569600043
dc.keywordsN-doped Tio2
dc.keywordsOptical-properties
dc.keywordsBismuth vanadate
dc.keywordsOxygen evolution
dc.keywordsPhotoanodes
dc.keywordsPhotocurrent
dc.keywordsVacancy
dc.keywordsRoles
dc.language.isoeng
dc.publisherAmer Chemical Soc
dc.relation.ispartofJournal of Physical Chemistry Letters
dc.subjectChemistry
dc.subjectPhysical chemistry
dc.subjectNanoscience
dc.subjectNanotechnology
dc.subjectMaterials Science
dc.subjectPhysics
dc.titleThe fast-track water oxidation channel on BiVO4 opened by nitrogen treatment
dc.typeJournal Article
dspace.entity.typePublication
local.contributor.kuauthorKahraman, Abdullah
local.contributor.kuauthorBarzgarvishlaghi, Mahsa
local.contributor.kuauthorToker, Işınsu Baylam
local.contributor.kuauthorSennaroğlu, Alphan
local.contributor.kuauthorKaya, Sarp
local.publication.orgunit1GRADUATE SCHOOL OF SCIENCES AND ENGINEERING
local.publication.orgunit1College of Sciences
local.publication.orgunit1Research Center
local.publication.orgunit2Department of Physics
local.publication.orgunit2Department of Chemistry
local.publication.orgunit2KUTEM (Koç University Tüpraş Energy Center)
local.publication.orgunit2KUYTAM (Koç University Surface Science and Technology Center)
local.publication.orgunit2Graduate School of Sciences and Engineering
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