Publication: Field-emission scanning probe lithography with self-actuating and self-sensing cantilevers for devices with single digit nanometer dimensions
dc.contributor.coauthor | Rangelow, Ivo W. | |
dc.contributor.coauthor | Lenk, Claudia | |
dc.contributor.coauthor | Hofmann, Martin | |
dc.contributor.coauthor | Lenk, Steve | |
dc.contributor.coauthor | Ivanov, Tzvetan | |
dc.contributor.coauthor | Ahmad, Ahmad | |
dc.contributor.coauthor | Kaestner, Marcus | |
dc.contributor.coauthor | Guliyev, Elshad | |
dc.contributor.coauthor | Reuter, Christoph | |
dc.contributor.coauthor | Budden, Matthias | |
dc.contributor.coauthor | Zoellner, Jens-Peter | |
dc.contributor.coauthor | Holz, Mathias | |
dc.contributor.coauthor | Reum, Alexander | |
dc.contributor.coauthor | Durrani, Zahid | |
dc.contributor.coauthor | Jones, Mervyn | |
dc.contributor.coauthor | Aydoğan, Cemal | |
dc.contributor.coauthor | Kuehnel, Michael | |
dc.contributor.coauthor | Frohlich, Thomas | |
dc.contributor.coauthor | Fuessl, Roland | |
dc.contributor.coauthor | Manske, E. | |
dc.contributor.department | Department of Mechanical Engineering | |
dc.contributor.department | Graduate School of Sciences and Engineering | |
dc.contributor.kuauthor | Alaca, Burhanettin Erdem | |
dc.contributor.kuauthor | Biçer, Mahmut | |
dc.contributor.schoolcollegeinstitute | College of Engineering | |
dc.contributor.schoolcollegeinstitute | GRADUATE SCHOOL OF SCIENCES AND ENGINEERING | |
dc.date.accessioned | 2024-11-09T12:11:30Z | |
dc.date.issued | 2018 | |
dc.description.abstract | Cost-effective generation of single-digit nano-lithographic features could be the way by which novel nanoelectronic devices, as single electron transistors combined with sophisticated CMOS integrated circuits, can be obtained. The capabilities of Field-Emission Scanning Probe Lithography (FE-SPL) and reactive ion etching (RIE) at cryogenic temperature open up a route to overcome the fundamental size limitations in nanofabrication. FE-SPL employs Fowler-Nordheim electron emission from the tip of a scanning probe in ambient conditions. The energy of the emitted electrons (<100 eV) is close to the lithographically relevant chemical excitations of the resist, thus strongly reducing proximity effects. The use of active, i.e. self-sensing and self-actuated, cantilevers as probes for FE-SPL leads to several promising performance benefits. These include: (1) Closed-loop lithography including pre-imaging, overlay alignment, exposure, and post-imaging for feature inspection; (2) Sub-5-nm lithographic resolution with sub-nm line edge roughness; (3) High overlay alignment accuracy; (4) Relatively low costs of ownership, since no vacuum is needed, and ease-of-use. Thus, FE-SPL is a promising tool for rapid nanoscale prototyping and fabrication of high resolution nanoimprint lithography templates. To demonstrate its capabilities we applied FE-SPL and RIE to fabricate single electron transistors (SET) targeted to operate at room temperature. Electrical characterization of these SET confirmed that the smallest functional structures had a diameter of only 1.8 nanometers. Devices at single digit nano-dimensions contain only a few dopant atoms and thus, these might be used to store and process quantum information by employing the states of individual atoms. | |
dc.description.fulltext | YES | |
dc.description.indexedby | WOS | |
dc.description.indexedby | Scopus | |
dc.description.openaccess | YES | |
dc.description.publisherscope | International | |
dc.description.sponsoredbyTubitakEu | EU | |
dc.description.sponsorship | European Union (European Union) | |
dc.description.sponsorship | Horizon 2020 | |
dc.description.sponsorship | European Research Council (ERC) European Union's Seventh Framework Program | |
dc.description.sponsorship | FP7/2007-2013 | |
dc.description.version | Publisher version | |
dc.identifier.doi | 10.1117/12.2299955 | |
dc.identifier.eissn | 1996-756X | |
dc.identifier.embargo | NO | |
dc.identifier.filenameinventoryno | IR01289 | |
dc.identifier.isbn | 978-1-5106-1661-5 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.quartile | N/A | |
dc.identifier.scopus | 2-s2.0-85050209466 | |
dc.identifier.uri | https://doi.org/10.1117/12.2299955 | |
dc.identifier.wos | 454731800003 | |
dc.keywords | Scanning probe lithography | |
dc.keywords | SPL | |
dc.keywords | Nanofabrication | |
dc.keywords | Calixarene | |
dc.keywords | Molecular glass resist | |
dc.keywords | Closed loop lithography | |
dc.keywords | Nanoprobe maskless lithography | |
dc.keywords | Self-developing resist | |
dc.language.iso | eng | |
dc.publisher | Society of Photo-optical Instrumentation Engineers (SPIE) | |
dc.relation.grantno | 318804 | |
dc.relation.ispartof | Proceedings of SPIE - The International Society for Optical Engineering | |
dc.relation.uri | http://cdm21054.contentdm.oclc.org/cdm/ref/collection/IR/id/8146 | |
dc.subject | Optics | |
dc.title | Field-emission scanning probe lithography with self-actuating and self-sensing cantilevers for devices with single digit nanometer dimensions | |
dc.type | Conference Proceeding | |
dspace.entity.type | Publication | |
local.contributor.kuauthor | Alaca, Burhanettin Erdem | |
local.contributor.kuauthor | Biçer, Mahmut | |
local.publication.orgunit1 | GRADUATE SCHOOL OF SCIENCES AND ENGINEERING | |
local.publication.orgunit1 | College of Engineering | |
local.publication.orgunit2 | Department of Mechanical Engineering | |
local.publication.orgunit2 | Graduate School of Sciences and Engineering | |
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relation.isOrgUnitOfPublication | 3fc31c89-e803-4eb1-af6b-6258bc42c3d8 | |
relation.isOrgUnitOfPublication.latestForDiscovery | ba2836f3-206d-4724-918c-f598f0086a36 | |
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relation.isParentOrgUnitOfPublication | 434c9663-2b11-4e66-9399-c863e2ebae43 | |
relation.isParentOrgUnitOfPublication.latestForDiscovery | 8e756b23-2d4a-4ce8-b1b3-62c794a8c164 |
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