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Real- and Q-space travelling: multi-dimensional distribution maps of crystal-lattice strain (epsilon(044)) and tilt of suspended monolithic silicon nanowire structures

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Dolabella, Simone
Frison, Ruggero
Chahine, Gilbert A.
Richter, Carsten
Schulli, Tobias U.
Taşdemir, Zuhal
Leblebici, Yusuf
Dommann, Alex
Neels, Antonia

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Silicon nanowire-based sensors find many applications in micro- and nano-electromechanical systems, thanks to their unique characteristics of flexibility and strength that emerge at the nanoscale. This work is the first study of this class of micro- and nano-fabricated silicon-based structures adopting the scanning X-ray diffraction microscopy technique for mapping the in-plane crystalline strain (epsilon(044)) and tilt of a device which includes pillars with suspended nanowires on a substrate. It is shown how the micro- and nanostructures of this new type of nanowire system are influenced by critical steps of the fabrication process, such as electron-beam lithography and deep reactive ion etching. X-ray analysis performed on the 044 reflection shows a very low level of lattice strain (<0.00025 Delta d/d) but a significant degree of lattice tilt (up to 0.214 degrees). This work imparts new insights into the crystal structure of micro- and nanomaterial-based sensors, and their relationship with critical steps of the fabrication process.

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International Union of Crystallography

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Chemistry, multidisciplinary, Crystallography

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Journal of Applied Crystallography

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10.1107/S1600576719015504

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