Publication: Monolithic fabrication of silicon nanowires bridging thick silicon structures
dc.contributor.coauthor | Peric, Oliver | |
dc.contributor.coauthor | Sacchetto, Davide | |
dc.contributor.coauthor | Fantner, Georg Ernest | |
dc.contributor.coauthor | Leblebici, Yusuf | |
dc.contributor.department | N/A | |
dc.contributor.department | Department of Mechanical Engineering | |
dc.contributor.kuauthor | Taşdemir, Zuhal | |
dc.contributor.kuauthor | Alaca, Burhanettin Erdem | |
dc.contributor.kuprofile | PhD Student | |
dc.contributor.kuprofile | Faculty Member | |
dc.contributor.other | Department of Mechanical Engineering | |
dc.contributor.researchcenter | Koç University Surface Science and Technology Center (KUYTAM) / Koç Üniversitesi Yüzey Teknolojileri Araştırmaları Merkezi (KUYTAM) | |
dc.contributor.schoolcollegeinstitute | Graduate School of Sciences and Engineering | |
dc.contributor.schoolcollegeinstitute | College of Engineering | |
dc.contributor.yokid | N/A | |
dc.contributor.yokid | 115108 | |
dc.date.accessioned | 2024-11-09T22:48:53Z | |
dc.date.issued | 2018 | |
dc.description.abstract | A monolithic process is developed for the fabrication of Si nanowires within thick Si substrates. A combination of anisotropic etch and sidewall passivation is utilized to protect and release Si lines during the subsequent deep etch. An etch depth of 10 mu m is demonstrated with a future prospect for 50 mu m opening up new possibilities for the deterministic integration of nanowires with microsystems. Nanowires with in-plane dimensions as low as 20 nm and aspect ratios up to 150 are obtained. Nanomechanical characterization through bending tests further confirms structural integrity of the connection between nanowires and anchoring Si microstructures. | |
dc.description.indexedby | WoS | |
dc.description.indexedby | Scopus | |
dc.description.issue | 6 | |
dc.description.openaccess | YES | |
dc.description.publisherscope | International | |
dc.description.sponsorship | TUBITAK[112E058] | |
dc.description.sponsorship | Koc University-İstanbul Rotary Club Fundamental Research Seed Fund Program | |
dc.description.sponsorship | Swiss Government Excellence Scholarship | |
dc.description.sponsorship | European Union [307338-NaMic] | |
dc.description.sponsorship | Swiss National Science Foundation [205320_152675] This work was supported in part by TUBITAKunder Grant 112E058 and in part by the Koc University-İstanbul Rotary Club Fundamental Research Seed Fund Program. The work of Z. Tasdemir was supported by Swiss Government Excellence Scholarship. The work of G. Fantner was supported in part by the European Union FP7/2007-2013/ERC under Grant 307338-NaMic and in part by the Swiss National Science Foundation under Grant 205320_152675. | |
dc.description.volume | 17 | |
dc.identifier.doi | 10.1109/TNANO.2018.2868712 | |
dc.identifier.eissn | 1941-0085 | |
dc.identifier.issn | 1536-125X | |
dc.identifier.quartile | Q2 | |
dc.identifier.scopus | 2-s2.0-85056645670 | |
dc.identifier.uri | http://dx.doi.org/10.1109/TNANO.2018.2868712 | |
dc.identifier.uri | https://hdl.handle.net/20.500.14288/6415 | |
dc.identifier.wos | 449979300031 | |
dc.keywords | Atomic force microscopy (AFM) | |
dc.keywords | Bending test | |
dc.keywords | Silicon nanowires (NWs) | |
dc.keywords | Single crystal reactive etching and metallization (SCREAM) | |
dc.language | English | |
dc.publisher | IEEE-Inst Electrical Electronics Engineers Inc | |
dc.source | IEEE Transactions on Nanotechnology | |
dc.subject | Electrical electronics engineering | |
dc.subject | Nanoscience | |
dc.subject | Nanotechnology | |
dc.subject | Physics | |
dc.subject | Materials science | |
dc.title | Monolithic fabrication of silicon nanowires bridging thick silicon structures | |
dc.type | Journal Article | |
dspace.entity.type | Publication | |
local.contributor.authorid | 0000-0002-3092-5632 | |
local.contributor.authorid | 0000-0001-5931-8134 | |
local.contributor.kuauthor | Taşdemir, Zuhal | |
local.contributor.kuauthor | Alaca, Burhanettin Erdem | |
relation.isOrgUnitOfPublication | ba2836f3-206d-4724-918c-f598f0086a36 | |
relation.isOrgUnitOfPublication.latestForDiscovery | ba2836f3-206d-4724-918c-f598f0086a36 |